Because of its high conductivity and low consumption rate, Platinum is an excellent anode material. Due to its high cost, Platinum is made practical for use by electroplating a thin layer over a high corrosion resistance substrate. Since Titanium, Niobium and Tantalum substrates are having the ability to form an insulating oxide film under anodic conditions, they are all most commonly used as anode in ICCP. Among them, Titanium is less expensive; however, it has a much lower breakdown potential than Niobium or Tantalum. The titanium oxide breaks down at anodic potentials in the 12 V range.

Platinized Titanium anodes take advantage of the low consumption rate and high current density. Voltages in excess of 10 Volts will result in severe pitting of the titanium core causing premature failure.

Platinized Niobium anodes also take advantage of the properties of platinum, but avoid the low driving voltage restriction of Platinized titanium anodes. Breakdown of the niobium oxide film occurs at approximately 120 Volts. Thus these anodes are used where high driving voltage is required. Platinized anodes are quite expensive but have an extremely long life. They are therefore an economical choice for critical applications.